Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology [Elektronische Ressource] / von Vanessa Capodieci
124 Pages
English

Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology [Elektronische Ressource] / von Vanessa Capodieci

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Published 01 January 2006
Reads 11
Language English
Document size 5 MB